Spin-Wave Optics in YIG Realized by Ion-Beam Irradiation

Authors: Kiechle, M., Papp, A., Mendisch, S., Ahrens, V., Golibrzuch, M., Bernstein, G. H., Porod, W., Csaba, G., Becherer, M.

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Direct focused-ion-beam writing is presented as an enabling technology for realizing functional spin-wave devices of high complexity, and demonstrate its potential by optically-inspired designs. It is shown that ion-beam irradiation changes the characteristics of yttrium iron garnet films on a submicron scale in a highly controlled way, allowing one to engineer the magnonic index of refraction adapted to desired applications. This technique does not physically remove material, and allows rapid fabrication of high-quality architectures of modified magnetization in magnonic media with minimal edge damage (compared to more common removal techniques such as etching or milling). By experimentally showing magnonic versions of a number of optical devices (lenses, gratings, Fourier-domain processors) this technology is envisioned as the gateway to building magnonic computing devices that rival their optical counterparts in their complexity and computational power.

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